The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2011

Filed:

Jun. 19, 2007
Applicants:

Jean-luc Dorier, Bussigny-pres-Lausanne, CH;

Christoph Hollenstein, Lutry, CH;

Gérard Barbezat, Winterthur, CH;

Arno Refke, Mellingen, CH;

Inventors:

Jean-Luc Dorier, Bussigny-pres-Lausanne, CH;

Christoph Hollenstein, Lutry, CH;

Gérard Barbezat, Winterthur, CH;

Arno Refke, Mellingen, CH;

Assignee:

Sulzer Metco AG, Wohlen, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a plasma spraying device () for spraying a coating () onto a substrate () by a thermal spray process. Said plasma spraying device () includes a plasma torch () for heating up a plasma gas () in a heating zone (), wherein the plasma torch () includes a nozzle body () for forming a plasma gas stream (), and said plasma torch () has an aperture () running along a central longitudinal axis () through said nozzle body (). The aperture () has an convergent section () with an inlet () for the plasma gas (), a throat section () including a minimum cross-sectional area of the aperture, and a divergent section () with an outlet () for the plasma gas stream (), wherein an introducing duct () is provided for introducing a liquid precursor () into the plasma gas stream (). According to the invention a penetration means () is provided to penetrate the liquid precursor () inside the plasma gas stream (). The invention relates also to a method for introducing a liquid precursor () into a plasma gas stream () as well as to the use of a plasma spraying device () and a method in accordance with the present invention for coating a surface of a substrate ().


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