Pramerdorf, Austria

Christoph Flötgen

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2015-2020

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4 patents (USPTO):Explore Patents

Title: Christoph Flötgen: Innovator in Wafer Bonding Technology

Introduction

Christoph Flötgen is a notable inventor based in Pramerdorf, Austria. He has made significant contributions to the field of wafer bonding technology, holding a total of 4 patents. His innovative methods have advanced the capabilities of substrate bonding, which is crucial in various technological applications.

Latest Patents

One of Christoph Flötgen's latest patents is a method for permanently bonding wafers. This invention outlines a detailed process for bonding a first contact surface of a first substrate to a second contact surface of a second substrate. The method includes forming a reservoir in a surface layer on the first contact surface, filling the reservoir with a first educt or a group of educts, and then contacting the two surfaces to create a prebond connection. The final step involves forming a permanent bond, which is strengthened by the reaction of the first educt with a second educt contained in a reaction layer of the second substrate.

Career Highlights

Christoph Flötgen is currently employed at Ev Group E. Thallner GmbH, where he continues to develop innovative solutions in wafer bonding technology. His work has been instrumental in enhancing the efficiency and effectiveness of substrate bonding processes.

Collaborations

Throughout his career, Christoph has collaborated with several talented individuals, including Thomas Plach and Kurt Hingerl. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Christoph Flötgen's contributions to wafer bonding technology exemplify his dedication to innovation and excellence in the field. His patents and collaborative efforts continue to influence advancements in substrate bonding processes.

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