Location History:
- Maastricht, NL (2013 - 2018)
- Eindhoven, NL (2019 - 2020)
Company Filing History:
Years Active: 2013-2020
Title: The Inventor Spotlight: Christian Marinus Leewis
Introduction:
Christian Marinus Leewis is a prolific inventor based in Maastricht, NL. With an impressive portfolio of 10 patents, he has made significant contributions to the field of metrology and beyond.
Latest Patents:
One of Leewis's latest patents is on "Metrology robustness based on through-wavelength similarity." This method involves obtaining a measurement result from a target on a substrate, determining a parameter characterizing the dependence of the measurement result on an optical path length, and adjusting the substrate measurement recipe based on specified ranges.
Career Highlights:
Leewis is affiliated with ASML Netherlands B.V., a leading company in the technology industry. His innovative work at ASML has led to advancements in metrology techniques, pushing the boundaries of precision and accuracy in semiconductor manufacturing.
Collaborations:
Throughout his career, Leewis has collaborated with skilled professionals such as Johannes Anna Quaedackers and Marcus Adrianus Van De Kerkhof. These collaborations have enriched his work, leading to the development of groundbreaking solutions in the realm of metrology.
Conclusion:
In conclusion, Christian Marinus Leewis's dedication to innovation and his numerous patents stand as a testament to his expertise in the field of metrology. His contributions have not only advanced technological capabilities but also paved the way for future developments in the industry.