The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Feb. 23, 2010
Applicants:
Johannes Anna Quaedackers, Veldhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Christian Marinus Leewis, Maastricht, NL;
Inventors:
Johannes Anna Quaedackers, Veldhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Christian Marinus Leewis, Maastricht, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
During a multiple patterning process every nelement of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.