Location History:
- Tempe, AZ (US) (2022)
- Hsinchu, TW (2023)
Company Filing History:
Years Active: 2022-2023
Title: Chris Keh-Yeuan Li: Innovator in Chemical Mechanical Planarization
Introduction
Chris Keh-Yeuan Li is a notable inventor based in Tempe, AZ (US). He has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a total of 2 patents, Li's work focuses on enhancing the efficiency and effectiveness of chemical mechanical planarization (CMP) processes.
Latest Patents
Li's latest patents include a "Chemical mechanical planarization composition for polishing oxide materials and method of use thereof." This patent describes polishing compositions that utilize ceria coated silica particles and organic acids, achieving high silicon oxide removal rates essential for advanced semiconductor device manufacturing. Another significant patent is the "Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications." This formulation offers high and tunable copper removal rates while minimizing copper dishing, making it suitable for both broad and advanced node copper applications.
Career Highlights
Chris Keh-Yeuan Li is currently employed at Versum Materials US, LLC, where he continues to develop innovative solutions for the semiconductor industry. His expertise in CMP formulations has positioned him as a key player in advancing semiconductor manufacturing technologies.
Collaborations
Li has collaborated with esteemed colleagues such as Ming-Shih Tsai and Rung-Je Yang, contributing to the development of cutting-edge CMP technologies.
Conclusion
Chris Keh-Yeuan Li's contributions to the field of chemical mechanical planarization have significantly impacted semiconductor manufacturing. His innovative patents and ongoing work at Versum Materials US, LLC highlight his dedication to advancing technology in this critical industry.