Chintan Patel

Title: Chintan Patel: Innovator in CMP Cleaning Technologies

Introduction

Chintan Patel is a notable inventor based in Tyngsboro, MA (US). He has made significant contributions to the field of cleaning technologies, particularly in chemical mechanical polishing (CMP) processes. With a total of 2 patents, Patel's work focuses on enhancing cleaning performance through innovative designs.

Latest Patents

Patel's latest patents include groundbreaking inventions aimed at improving cleaning efficiency. One of his patents, titled "Nodule ratios for targeted enhanced cleaning performance," describes a foam brush designed with nodules on its outer diameter surface. These nodules have a pitch to diameter ratio (P/D) of between 1.2 and 1.5 and a nodule height to nodule diameter ratio of 0.2 to 0.5. This design allows for improved removal of small particles and organic residues from substrates following CMP processing. Additionally, he has developed a patent for "CMP brush packaging," which outlines a method for packaging a CMP brush that includes saturating the brush with a liquid and using a rigid polymer tubular shipping container.

Career Highlights

Chintan Patel works at Entegris, Inc., where he continues to innovate in the field of CMP cleaning technologies. His expertise and dedication to improving cleaning processes have made him a valuable asset to his company.

Collaborations

Patel collaborates with talented coworkers, including Patrick Doering and David Trio, who contribute to the development of advanced cleaning solutions.

Conclusion

Chintan Patel's innovative work in CMP cleaning technologies showcases his commitment to enhancing cleaning performance through thoughtful design and engineering. His contributions are paving the way for more effective cleaning solutions in various applications.