The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Feb. 20, 2015
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventor:

Chintan Patel, Tyngsboro, MA (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 1/04 (2006.01); B08B 1/00 (2006.01); H01L 21/02 (2006.01); B24B 37/34 (2012.01);
U.S. Cl.
CPC ...
H01L 21/67046 (2013.01); B08B 1/002 (2013.01); B08B 1/04 (2013.01); B24B 37/34 (2013.01); H01L 21/02074 (2013.01); H01L 21/02096 (2013.01);
Abstract

A foam brush that has nodules on an outer diameter surface of the brush that have a pitch to diameter ratio (P/D) of between 1.2 and 1.5 and a nodule height to nodule diameter ratio of 0.2 to 0.5 can be used to achieve improved small particle and organic residue removal from substrates following CMP processing. CMP cleaning brushes of the disclosure may also be prepared with foams that are relatively soft and have a compression strength of less than 90 grams/cm. CMP cleaning brushes with such P/D and H/D ratios, and optionally a compression strength of less than 90 grams/cmcan be used in a variety of CMP cleaning processes including post copper CMP processes.


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