Zhubei, Taiwan

Ching-Wen Cheng

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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6 patents (USPTO):Explore Patents

Title: Innovations of Ching-Wen Cheng

Introduction

Ching-Wen Cheng is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of six patents. His work focuses on enhancing the efficiency and effectiveness of wafer cleaning systems.

Latest Patents

Cheng's latest patents include innovative designs such as the "Rounded Vertical Wafer Vessel Rods." This invention features a system that comprises a base and a rod set with multiple rods connected to the base. Each rod includes multiple fingers arranged in a vertically-stacked manner, designed to receive a bevel of a wafer while minimizing particle generation. Another significant patent is for "Fittings for Wafer Cleaning Systems." This fitting is designed for an upper brush in a double brush scrubbing chamber, featuring a base plate, a flanged pipe, and a threaded connector. This structure is engineered to provide fluid while minimizing particle generation, showcasing Cheng's commitment to improving semiconductor cleaning processes.

Career Highlights

Ching-Wen Cheng works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves collaborating with other experts in the field to develop innovative solutions that enhance manufacturing processes.

Collaborations

Cheng has worked alongside talented colleagues such as Kuei-Hsiung Cho and Xin-Kai Huang. Their combined expertise contributes to the advancement of technology in semiconductor manufacturing.

Conclusion

Ching-Wen Cheng's contributions to the semiconductor industry through his patents and collaborative efforts highlight his innovative spirit and dedication to improving wafer cleaning systems. His work continues to influence the field significantly.

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