Location History:
- Miao Li, TW (2004)
- Fongtian Jhuolan Township, TW (2015)
Company Filing History:
Years Active: 2004-2015
Title: Contributions of Ching-Ming Tsai in the Field of Semiconductor Processing
Introduction
Ching-Ming Tsai, an accomplished inventor located in Miaoli, Taiwan, has made significant contributions in the field of semiconductor processing. With a total of three patents to his name, Tsai's innovations are vital to improving manufacturing methods in the electronics industry.
Latest Patents
One of Tsai's recent innovations is the Barrier-slurry-free copper CMP process. This advanced method of polishing metal layers involves several meticulously designed steps. Initially, a structure with a patterned dielectric layer is provided. A barrier layer is then formed, followed by the application of a metal layer to fill the opening created by the dielectric layer. Subsequent polishing steps utilize specific slurry compositions to carefully remove portions of the metal layer and the barrier layer, ultimately exposing the underlying dielectric layers. This multi-step process enhances the efficiency and precision of metal layer polishing in semiconductor fabrication.
Career Highlights
Ching-Ming Tsai is currently employed by Taiwan Semiconductor Manufacturing Company Ltd. His expertise in chemical mechanical polishing (CMP) methods has positioned him as a key player in advancing semiconductor technologies. His patents reflect not only his innovative mind but also his commitment to pushing boundaries in efficient manufacturing processes.
Collaborations
Throughout his career, Tsai has collaborated with notable professionals, including Yi-Chen Chen and Ray-Ting Chang. These partnerships have contributed significantly to refining the processes and technologies within their field, showcasing the importance of teamwork in innovation.
Conclusion
Ching-Ming Tsai's contributions to the realm of semiconductor processing underscore the importance of innovation in technology. With his inventive spirit and collaborative efforts, he continues to make strides in enhancing the efficiency of semiconductor manufacturing. As industries evolve, the impact of his work will undoubtedly resonate within the technology landscape for years to come.