Ching-Mei Hsu

Title: Innovations and Contributions of Ching-Mei Hsu in Semiconductor Technology

Introduction

Ching-Mei Hsu, based in Stanford, California, is a notable inventor recognized for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 24 patents, Hsu continues to advance innovations that enhance the efficiency and performance of semiconductor devices.

Latest Patents

Among his latest innovations, Hsu has developed two pivotal patents:

1. **Airgap Formation Processes** - This patent details processing methods to create an airgap spacer on semiconductor substrates. It encompasses the formation of a spacer structure composed of two materials, procedures for establishing a source/drain structure, and the etching of the second material to achieve the airgap, which remains unaffected by etchant materials during the etching process.

2. **Selective Material Removal** - Hsu's methods for removing nitride involve a fluorine-containing precursor introduced into a remote plasma region of a semiconductor chamber. By creating a plasma within this region, Hsu generates effluents that facilitate the etching of exposed nitride while also introducing a hydrogen-containing precursor to enhance the etching process, ensuring effective material removal.

Career Highlights

Ching-Mei Hsu has been affiliated with prestigious organizations such as Applied Materials, Inc. and Leland Stanford Junior University, where he has played a crucial role in advancing semiconductor processing technologies. His expertise and innovative approaches have positioned him as a key figure in the industry, driving forward-thinking solutions for complex challenges.

Collaborations

Throughout his career, Hsu has collaborated with esteemed colleagues, notably Nitin K. Ingle and Anchuan Wang. These partnerships have fostered an environment of innovation, resulting in groundbreaking work that has pushed the boundaries of semiconductor research and development.

Conclusion

Ching-Mei Hsu’s extensive patent portfolio and collaborative efforts exemplify his dedication to advancing semiconductor technology. His innovations continue to make a substantial impact on the industry, paving the way for future advancements that will shape the next generation of electronic devices.