The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
May. 04, 2015
Applied Materials, Inc., Santa Clara, CA (US);
Anchuan Wang, San Jose, CA (US);
Xinglong Chen, San Jose, CA (US);
Zihui Li, Santa Clara, CA (US);
Hiroshi Hamana, Hyogo, JP;
Zhijun Chen, San Jose, CA (US);
Ching-Mei Hsu, Stanford, CA (US);
Jiayin Huang, Fremont, CA (US);
Nitin K. Ingle, San Jose, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Shankar Venkataraman, San Jose, CA (US);
Randhir Thakur, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools.