Chin-Yu Lin

Title: Innovations of Chin-Yu Lin

Introduction

Chin-Yu Lin is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing image sensor structures and semiconductor device fabrication methods.

Latest Patents

Chin-Yu Lin's latest patents include an innovative image sensor grid and a method for fabricating semiconductor devices. The image sensor structure he developed features a semiconductor device with multiple image sensing elements, an interconnect structure, and a composite grid structure. This composite grid includes a tungsten grid, an oxide grid, and an adhesion enhancement grid that optimizes the performance of the image sensor. Additionally, his method for forming a semiconductor device involves creating a metal catalyst layer, performing a wet etch process to form a trench, and subsequently removing the catalyst layer, which streamlines the fabrication process.

Career Highlights

Chin-Yu Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of semiconductor technology and contribute to advancements in image sensing.

Collaborations

Chin-Yu Lin has collaborated with notable colleagues such as Keng-Ying Liao and Huai-jen Tung. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Chin-Yu Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in image sensor technology and semiconductor fabrication methods.