Chin-Wei Hu

Title: Innovations of Chin-Wei Hu

Introduction

Chin-Wei Hu is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and functionality of transistors, which are crucial components in modern electronic devices.

Latest Patents

One of Chin-Wei Hu's latest patents is titled "Transistor with etching stop layer and manufacturing method thereof." This invention provides a novel transistor structure that includes a substrate, a crystalline semiconductor layer, an etching stop structure, an ohmic contact layer, a source, a drain, a gate insulating layer, and a gate. The manufacturing method described in the patent involves patterning the ohmic contact layer and the crystalline semiconductor layer simultaneously using the same mask. Additionally, it allows for the patterning of the ohmic contact layer and the source/drain layer at the same time with another identical mask. This innovative approach aims to improve the manufacturing process of transistors, making it more efficient and reliable.

Career Highlights

Chin-Wei Hu is currently employed at AU Optronics Corporation, a leading company in the display technology industry. His role involves research and development in semiconductor devices, where he applies his expertise to create advanced technologies that drive innovation in the field.

Collaborations

Chin-Wei Hu has collaborated with notable colleagues, including Chih-Wei Chao and Chi-Wen Chen. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the development of cutting-edge technologies.

Conclusion

Chin-Wei Hu's contributions to the field of semiconductor technology through his patents and work at AU Optronics Corporation highlight his role as an influential inventor. His innovative approaches to transistor design and manufacturing continue to impact the electronics industry positively.