Company Filing History:
Years Active: 1997-2004
Title: Innovations by Inventor Chin-Hsiung Ho
Introduction
Chin-Hsiung Ho, located in Sunnyvale, CA, is a prominent inventor with a remarkable portfolio of 11 patents. His innovative contributions primarily focus on advancements in semiconductor technology, showcasing his expertise in developing methods that enhance manufacturing processes.
Latest Patents
Among his latest innovations is a patented technique titled "Method for depositing silicon oxide incorporating an outgassing step." This method aims to deposit an inter-metal-dielectric (IMD) layer on semiconductor substrates without the risk of cracking. By first heat-treating the substrate to at least 300°C in the plasma process chamber, this approach effectively removes impurity gases that could be trapped under the IMD layer during subsequent plasma deposition, significantly minimizing potential defects.
Another noteworthy patent is for an "Electrostatic charge-free solvent-type dryer for semiconductor wafers." This invention addresses the challenge of drying semiconductor wafers post-wet bench processing. The dryer is designed with materials that prevent electrostatic charge buildup, ensuring a safe drying process. Additionally, an alternate embodiment features a deionizer that neutralizes negative ions, enhancing the reliability of the drying process.
Career Highlights
Chin-Hsiung Ho's innovative work has been instrumental in his role at Taiwan Semiconductor Manufacturing Company Ltd., a leading organization in the semiconductor industry. His patents reflect a deep understanding of technical challenges and the ability to devise effective solutions that cater to the needs of modern semiconductor fabrication.
Collaborations
Throughout his career, Chin-Hsiung has collaborated with talented engineers, including ChaoChieh Tsai and Chung-Te Lin. These partnerships have fostered a creative environment that enhances the development of groundbreaking semiconductor technologies.
Conclusion
Chin-Hsiung Ho's contributions to the field of semiconductor manufacturing through his innovative patents are commendable. His work not only addresses existing technological challenges but also paves the way for future advancements in semiconductor processes, demonstrating the significant impact inventors have on the industry.