The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
Jun. 20, 2001
Jih-Churng Twu, Chung-Ho, TW;
Ming-Dar Guo, Tainan, TW;
Tsung-Chieh Tsai, Tainan, TW;
Sheng-Hsiung Tseng, Tainan, TW;
Wei-Ming You, Taipei, TW;
Yao-Pin Huang, Tainan, TW;
Chia-Chun Cheng, Tainan, TW;
Chin-Hsiung Ho, Sunnyvale, CA (US);
Ming Te More, Tainan, TW;
Taiwan Semiconductor Manufacturing Co. Ltd., Hsin Chu, TW;
Abstract
An electrostatic charge-free solvent-type dryer for drying semiconductor wafers after a wet bench process is disclosed in a preferred embodiment and in an alternate embodiment. In the preferred embodiment, the electrostatic charge-free solvent-type dryer is constructed by a tank body, a wafer carrier, an elevator means, a tank cover and a conduit for feeding the flow of solvent vapor. At least one of the tank cover, the conduit for feeding the flow of solvent vapor and the plurality of partition plates is fabricated of a non-electrostatic material such that electrostatic charge is not generated in the flow of solvent vapor. In the alternate embodiment, a deionizer is further provided in the tank cavity for producing a flux of positive ions to neutralize any negative ions that are possibly produced in the flow of solvent vapor.