Location History:
- Kaoshiong, TW (2002)
- Tainan, TW (2002 - 2003)
Company Filing History:
Years Active: 2002-2003
Title: Innovations by Inventor Ming-Dar Guo
Introduction
Ming-Dar Guo is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes related to the cleaning and drying of semiconductor wafers.
Latest Patents
One of his latest patents is the "Electrostatic charge-free solvent-type dryer for semiconductor wafers." This invention provides a solution for drying semiconductor wafers after a wet bench process without generating electrostatic charges. The design includes a tank body, a wafer carrier, an elevator means, a tank cover, and a conduit for solvent vapor flow. The materials used in the construction prevent electrostatic charge generation, ensuring the integrity of the wafers.
Another notable patent is the "Apparatus and method for wet cleaning wafers without ammonia vapor damage." This invention outlines a method for cleaning wafers using a wet bench technique that avoids ammonia vapor damage. The apparatus consists of a tank body for holding a cleaning solution and a conduit for feeding an ammonia-containing solution. A cup-shaped container is strategically placed to block ammonia vapor from reaching the upper cavity of the tank, thus protecting the wafer surface.
Career Highlights
Ming-Dar Guo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the semiconductor industry. His expertise and inventions have contributed to advancements in wafer processing technologies.
Collaborations
He has collaborated with notable coworkers, including Jih-Churng Twu and Chia-Chun Cheng, who share his commitment to innovation in semiconductor technology.
Conclusion
Ming-Dar Guo's contributions to the semiconductor industry through his patents demonstrate his dedication to advancing technology. His innovative solutions for wafer cleaning and drying processes are vital for the continued progress in semiconductor manufacturing.