Hsinchu, Taiwan

Chin-Heng Shen

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1997-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chin-Heng Shen. Retrieved from https://idiyas.com/inventor/chin-heng-shen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1997-2001

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2 patents (USPTO):Explore Patents

Title: Innovations by Chin-Heng Shen

Introduction

Chin-Heng Shen is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the efficiency and functionality of integrated circuits.

Latest Patents

One of his latest patents is a method to produce dual polysilicon resistance in an integrated circuit. This innovative method describes a process for forming polysilicon resistors with differing resistances using a dual polysilicon approach. The process involves depositing a first polysilicon layer over a dielectric layer on a semiconductor substrate, followed by etching away the first layer where it is not covered by a mask. A second polysilicon layer is then deposited, and both layers are patterned to create structures with distinct resistances. The first polysilicon structure exhibits a lower resistance compared to the second, enhancing the performance of the integrated circuit.

Another significant patent is related to the fabrication of semiconductor chips separated by scribe lines. This process addresses the issue of photoresist thinning at the edges of silicon chips, which can lead to inconsistencies in chip quality. By creating a chessboard pattern of raised insulator and metal features in the scribe line region, the differences in topography between the scribe line and chip regions are minimized. This innovation allows for improved laser or optical endpoint detection during reactive ion etching processes.

Career Highlights

Chin-Heng Shen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies that are essential for modern electronics.

Collaborations

Throughout his career, Chin-Heng Shen has collaborated with esteemed colleagues such as Ying-Chem Chao and Dah-Chih Lin. These collaborations have further enriched his research and development efforts in semiconductor technology.

Conclusion

Chin-Heng Shen's innovative patents and contributions to the semiconductor industry highlight his role as a key inventor in this field. His work continues to influence the development of advanced technologies that drive the electronics market forward.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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