Shanghai, China

Chin Chang Liao

This inventor holds 6 USPTO granted patents. Top assignee: Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2010-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chin Chang Liao. Retrieved from https://idiyas.com/inventor/chin-chang-liao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2010-2016

Loading Chart...
6 patents (USPTO):Explore Patents

Title: Chin Chang Liao: Innovator in Semiconductor Technology

Introduction

Chin Chang Liao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on developing innovative systems and methods that enhance the performance and reliability of integrated circuits.

Latest Patents

One of Liao's latest patents is titled "System and method for test structure on a wafer." This invention provides a test structure for testing integrated circuits, which are manufactured on the same substrate material. The testing is conducted in a temperature-controlled environment, ensuring accurate results. The test structure includes a top structure with a first metal material, featuring both a first and a second electrical terminal. Additionally, a bottom structure made of silicon is positioned below the integrated circuit, with side structures located adjacent to the integrated circuit.

Another notable patent is "System and method for I/O ESD protection with floating and/or biased polysilicon regions." This invention addresses electrostatic discharge protection through a system that includes multiple transistors. The design incorporates gate, source, and drain regions within an active area of the substrate, along with a polysilicon region that intersects the gate regions. This innovative approach enhances the robustness of semiconductor devices against electrostatic discharge.

Career Highlights

Chin Chang Liao is currently employed at Semiconductor Manufacturing International (Shanghai) Corporation, where he continues to push the boundaries of semiconductor technology. His expertise and innovative mindset have positioned him as a key player in the industry.

Collaborations

Liao has collaborated with notable coworkers, including Jun Huang and Ting Chieh Su. Their combined efforts contribute to the advancement of semiconductor technologies and the development of cutting-edge solutions.

Conclusion

Chin Chang Liao is a distinguished inventor whose work in semiconductor technology has led to several impactful patents. His contributions continue to shape the future of integrated circuits and electrostatic discharge protection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…