The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Sep. 06, 2006
Ting Chieh Su, Nantou, CN;
Min Chie Jeng, Cupertino, CA (US);
Chin Chang Liao, Shanghai, CN;
Jun Cheng Huang, Shanghai, CN;
Ting Chieh Su, Nantou, CN;
Min Chie Jeng, Cupertino, CA (US);
Chin Chang Liao, Shanghai, CN;
Jun Cheng Huang, Shanghai, CN;
Abstract
A system and method for electrostatic discharge protection. The system includes a plurality of transistors. The plurality of transistors includes a plurality of gate regions, a plurality of source regions, and a plurality of drain regions. The plurality of source regions and the plurality of drain regions are located within an active area in a substrate, and the active area is adjacent to at least an isolation region in the substrate. Additionally, the system includes a polysilicon region. The polysilicon region is separated from the substrate by a dielectric layer, and the polysilicon region intersects each of the plurality of gate regions. At least a part of the polysilicon region is on the active area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile