Chikao Mamiya

Title: Chikao Mamiya: Innovator in Thin Film Technology

Introduction

Chikao Mamiya is a prominent inventor based in Hachioji, Japan, known for his significant contributions to the field of thin film technology. With a total of 11 patents to his name, Mamiya has made remarkable advancements that have impacted various industries, particularly in the manufacturing of transparent gas barrier films.

Latest Patents

Mamiya's latest patents include a method for manufacturing a transparent gas barrier film specifically designed for organic electroluminescence elements. This innovative method involves forming a gas barrier layer on a substrate using plasma CVD, employing an organic silicon compound as a raw material gas and oxygen gas as a decomposition gas. The unique aspect of this method is the controlled variation of carbon content in the gas barrier layer throughout its thickness. Another notable patent is a thin film forming apparatus that utilizes plasma discharge processing to create high-quality thin films. This apparatus prevents reverse flow of processing gas, ensuring a uniform gas flow and superior film quality.

Career Highlights

Throughout his career, Chikao Mamiya has worked with notable companies such as Konica Minolta Holdings, Inc. and Konica Corporation. His experience in these organizations has allowed him to refine his expertise in thin film technology and contribute to various innovative projects.

Collaborations

Mamiya has collaborated with esteemed colleagues, including Kazuhiro Fukuda and Hiroaki Arita, further enhancing his work in the field of thin films. Their combined efforts have led to advancements that benefit the industry as a whole.

Conclusion

Chikao Mamiya's contributions to thin film technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in manufacturing processes and materials science.