The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Jun. 25, 2007
Chikao Mamiya, Tokyo, JP;
Ichiro Kudo, Tokyo, JP;
Masanobu Suzuki, Ibaraki, JP;
Kiyoshi Oishi, Tokyo, JP;
Daishi Yamashita, Tokyo, JP;
Chikao Mamiya, Tokyo, JP;
Ichiro Kudo, Tokyo, JP;
Masanobu Suzuki, Ibaraki, JP;
Kiyoshi Oishi, Tokyo, JP;
Daishi Yamashita, Tokyo, JP;
Konica Minolta Holdings, Inc., Tokyo, JP;
Abstract
Disclosed is a thin film forming apparatus which is a plasma discharge processing apparatus for performing a plasma discharge processing on the surface of a continuously transported base at or near atmospheric pressure, wherein a reverse flow of the processing gas is prevented and thus a thin film having good quality is formed by a uniform gas flow. The thin film forming apparatus is characterized by having an auxiliary gas discharge means for discharging an auxiliary gas for preventing a reverse flow of the processing gas. Also disclosed are a thin film forming method, and a thin film.