The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2016

Filed:

Nov. 22, 2013
Applicant:

Konica Minolta Holdings, Inc., Tokyo, JP;

Inventors:

Kazuhiro Fukuda, Hachioji, JP;

Toshio Tsuji, Hachioji, JP;

Chikao Mamiya, Hachioji, JP;

Hiroaki Arita, Hachioji, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); H01L 51/00 (2006.01); B32B 7/02 (2006.01); B32B 27/00 (2006.01); C23C 16/30 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0001 (2013.01); B32B 7/02 (2013.01); B32B 27/00 (2013.01); C23C 16/308 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01); C23C 16/402 (2013.01); H01L 51/5253 (2013.01); H01L 51/5256 (2013.01); H01L 2251/5346 (2013.01); Y10T 428/24942 (2015.01); Y10T 428/24992 (2015.01); Y10T 428/31504 (2015.04); Y10T 428/31663 (2015.04);
Abstract

A method for manufacturing a transparent gas barrier film for an organic electroluminescence element having a substrate with a gas barrier layer thereon. The gas barrier layer is formed on the substrate by plasma CVD using an organic silicon compound as a raw material gas and an oxygen gas as a decomposition gas. Formation of the gas barrier layer is carried out so that a carbon content of the gas barrier layer in the thickness direction repeatedly changes more than two times from high value, via intermediate value, low value and intermediate value, to high value.


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