Tomioka, Japan

Chiharu Ishikura

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Tanaka Kikinzoku Kogyo K.k.. Active years: 2022-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chiharu Ishikura. Retrieved from https://idiyas.com/inventor/chiharu-ishikura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022-2023

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4 patents (USPTO):Explore Patents

Title: Chiharu Ishikura: Innovator in Gold Sputtering Technology

Introduction

Chiharu Ishikura is a notable inventor based in Tomioka, Japan. She has made significant contributions to the field of materials science, particularly in the development of gold sputtering targets. With a total of four patents to her name, her work has implications for various applications in electronics and manufacturing.

Latest Patents

One of her latest patents involves a gold sputtering target that is composed of gold and inevitable impurities. This target features a sputtering surface with an average Vickers hardness ranging from 40 to 60. Additionally, the average crystal grain size of the target is between 15 micrometers and 200 micrometers. Notably, the {110} plane of gold is preferentially oriented at the sputtering surface, enhancing its performance in various applications.

Career Highlights

Chiharu Ishikura is currently employed at Tanaka Kikinzoku Kogyo K.K., a company renowned for its expertise in precious metals and materials. Her work at this organization has allowed her to focus on innovative solutions in the field of sputtering technology.

Collaborations

Chiharu has collaborated with several talented individuals, including Tetsuya Kato and Yohei Mizuno. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Chiharu Ishikura's contributions to the field of gold sputtering technology exemplify her innovative spirit and dedication to advancing materials science. Her patents and collaborations continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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