The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Jun. 05, 2020
Applicant:
Tanaka Kikinzoku Kogyo K. K., Tokyo, JP;
Inventors:
Assignee:
TANAKA KIKINZOKU KOGYO K. K., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22F 1/14 (2006.01); C23C 14/14 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22F 1/14 (2013.01); C23C 14/14 (2013.01); H01J 37/3426 (2013.01);
Abstract
A production method for a gold sputtering target includes: producing a gold sputtering target which is made of gold and inevitable impurities and in which an average value of Vickers hardness is 40 or more and 60 or less, an average value of crystal grain size is 15 μm or more and 200 μm or less, and the {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.
Quick Actions:
Kato, Tetsuya. (2023). Producing method for gold sputtering target and producing method for gold film (U.S. Patent No. 11555238). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11555238
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile