Chih-Peng Hsu

Title: Chih-Peng Hsu: Innovator in Fin Field-Effect Transistor Technology

Introduction

Chih-Peng Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of fin field-effect transistors. With a total of 13 patents to his name, Hsu's work has had a substantial impact on the industry.

Latest Patents

One of Hsu's latest patents involves a method for creating a fin field-effect transistor device. This method includes forming a first fin that protrudes above a substrate, which contains a PMOS region. The process involves creating a first gate structure over the fin, followed by the application of a first spacer layer. A second spacer layer is then formed over the first spacer layer. The method further includes a first etching process to remove the second spacer layer from the fin's top surface and sidewalls, followed by a second etching process to remove the first spacer layer. Finally, a first source/drain material is epitaxially grown over the fin, extending along its top surface and sidewalls.

Career Highlights

Chih-Peng Hsu has worked with notable companies in the semiconductor industry, including Advanced Optoelectronic Technology, Inc. and Taiwan Semiconductor Manufacturing Company. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in technology.

Collaborations

Hsu has collaborated with esteemed colleagues such as Chung-Min Chang and Wei-Ken Lin. These partnerships have fostered an environment of innovation and creativity, leading to advancements in semiconductor technology.

Conclusion

Chih-Peng Hsu is a distinguished inventor whose work in fin field-effect transistors has significantly influenced the semiconductor industry. His numerous patents and collaborations highlight his commitment to innovation and excellence in technology.