Chih-Ming Hsieh

Title: Innovations of Chih-Ming Hsieh in Semiconductor Manufacturing

Introduction

Chih-Ming Hsieh is a notable inventor based in Changhua County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on advanced methods for creating semiconductor device structures, which are crucial for modern electronics.

Latest Patents

Hsieh's latest patents include innovative methods for manufacturing semiconductor device structures. One of his patents describes a method that involves receiving a FinFET precursor with a fin structure and a gate structure. The process includes removing a top portion of the fin structure, growing a semiconductive layer, and performing an annealing process to form dislocations. Another patent outlines a similar method, emphasizing the patterning of the fin structure and the formation of a capping layer, followed by an annealing process to create dislocations along an upward step.

Career Highlights

Chih-Ming Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing manufacturing techniques that enhance the performance and efficiency of semiconductor devices.

Collaborations

Hsieh has collaborated with notable colleagues, including I-Chih Chen and Fu-Tsun Tsai. Their combined expertise contributes to the innovative projects at their company, further pushing the boundaries of semiconductor technology.

Conclusion

Chih-Ming Hsieh's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor technologies.