This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Title: Chih-Kai Hu: Innovator in Atomic Layer Deposition Technologies
Introduction
Chih-Kai Hu is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of atomic layer deposition (ALD) technologies, particularly in the semiconductor industry. With a total of 2 patents to his name, Hu's work focuses on enhancing the performance and reliability of critical components in process chambers.
Latest Patents
Chih-Kai Hu's latest patents revolve around multilayer ALD coatings for critical components in process chambers. One of his methods involves forming a first coating comprising amorphous rare earth metal-containing oxide directly on a surface of an article using a first ALD process. This process includes repeating alumina deposition cycles followed by rare earth metal oxide deposition cycles multiple times. The first coating is characterized by a specific thickness. Following this, a second coating of crystalline rare earth metal oxide is formed on the first coating using a second ALD process. A third coating of amorphous rare earth metal-containing oxide is then applied, followed by a fourth coating of crystalline rare earth metal oxide. This innovative approach enhances the durability and functionality of semiconductor components.
Career Highlights
Chih-Kai Hu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His expertise in ALD technologies has positioned him as a key contributor to advancements in semiconductor manufacturing processes. His work is instrumental in developing coatings that improve the performance of critical components.
Collaborations
Chih-Kai Hu collaborates with notable colleagues such as Chiun-Da Shiue and Chen-Hsiang Lu. Their combined efforts in research and development have led to significant advancements in the field of atomic layer deposition.
Conclusion
Chih-Kai Hu's innovative work in atomic layer deposition technologies has made a substantial impact on the semiconductor industry. His patents reflect a commitment to enhancing the performance of critical components, showcasing his role as a leading inventor in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile