Location History:
- Tainan, TW (2020)
- Taipei, TW (2005 - 2024)
Company Filing History:
7 out of 7,087 
1 out of 672 
2 out of 832,891 Years Active: 2005-2024
Title: The Innovative Mind of Chih-Hsien Tang
Introduction: Chih-Hsien Tang is a prominent inventor based in Taipei, Taiwan. With a remarkable portfolio of 10 patents, he has made significant contributions to the field of imprint lithography and nanoimprint processes. His innovative methods have paved the way for advancements in nanotechnology and materials science.
Latest Patents: Among Chih-Hsien Tang's latest patents is an imprint method that streamlines the process of creating patterns on a substrate. This method involves forming a first resist layer on a substrate and using a first mold in a printing step, followed by etching to create recess patterns. This patent specifies that the first recess pattern has a greater depth than subsequent recess patterns, demonstrating his attention to detail and precision in innovation.
Another notable patent outlines a method for forming patterns on a substrate via double nanoimprint lithography. This process incorporates two replicate molds, allowing for the imprinting of intricate patterns onto polymer layers. Subsequent etching processes ensure high fidelity in the transferred patterns, showcasing the versatility and effectiveness of his techniques.
Career Highlights: Throughout his career, Chih-Hsien Tang has worked with well-respected companies, including United Microelectronics Corporation. His expertise in developing advanced manufacturing processes and materials has significantly impacted the industry.
Collaborations: Chih-Hsien Tang has collaborated with esteemed colleagues such as Chin-Lung Lin and Yao-Jen Fan. Their collective efforts have further enhanced the capabilities and applications of imprint methods and nanoimprint technologies.
Conclusion: Chih-Hsien Tang exemplifies the spirit of innovation in the field of technology and engineering. With his extensive patent portfolio and collaborative spirit, he continues to push the boundaries of what is possible in substrate patterning and nanotechnology. His work not only reflects his unwavering dedication as an inventor but also contributes significantly to the advancement of the field.