Chih-Hsien Chen

Title: Innovations of Chih-Hsien Chen

Introduction

Chih-Hsien Chen is a notable inventor based in Miaoli County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work focuses on advanced methods for manufacturing through-silicon vias and planarization techniques.

Latest Patents

One of his latest patents is a method for manufacturing through-silicon vias (TSVs). This method involves several steps, including the formation of a stack structure with a substrate and an inter layer dielectric (ILD) layer. An opening is created that penetrates through the ILD layer and extends into the substrate. After forming an insulator layer and a metal barrier layer on the stack structure, a top metal layer is added to fulfill the opening. A first planarization process is conducted to remove a portion of the top metal layer, followed by a second planarization process that removes parts of the metal barrier layer, insulator layer, and top metal layer, with the endpoint determined by light interferometry or motor current.

Another significant patent involves a planarization method for manufacturing semiconductor components. In this process, a dielectric layer is formed above a substrate, defining a trench. A barrier layer and a metal layer are sequentially formed in the trench. A first planarization process is applied to the metal layer using a first reactant, which removes a portion of the metal layer. The etching rate of the first reactant to the metal layer is greater than that to the barrier layer. A second planarization process is then applied to both layers using a second reactant, exposing the dielectric layer.

Career Highlights

Chih-Hsien Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor technology, enhancing manufacturing efficiency and product quality.

Collaborations

Chih-Hsien Chen has collaborated with several talented individuals in his field, including Wei-Che Tsao and Jen-Chieh Lin. These collaborations have fostered a creative environment that promotes innovation and the development of cutting-edge technologies.

Conclusion

Chih-Hsien Chen's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.