logo

For the Inventor, By the Inventor

Hsinchu, Taiwan

Chih-Hsiang Fan

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2019-2025.

USPTO Granted Patents = 7 

% Patents Active = 100.0

Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:

goldMedal7 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2019-2025

Loading Chart...
7 patents (USPTO):Explore Patents
1. 12431356 - Metal gate structure and method of forming the same (2025-09-30),
2. 12100751 - Void elimination for gap-filling in high-aspect ratio trenches (2024-09-24),
3. 11961768 - CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same (2024-04-16),
4. 11682589 - CMOS finFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same (2023-06-20),
5. 11610982 - Void elimination for gap-filling in high-aspect ratio trenches (2023-03-21),
6. 10804161 - CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same (2020-10-13),
7. 10515807 - Methods of fabricating semiconductor devices with metal-gate work-function tuning layers (2019-12-24),

Title: Chih-Hsiang Fan: Innovator in Semiconductor Technology

Introduction

Chih-Hsiang Fan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His innovative approaches have advanced the manufacturing processes of semiconductor devices.

Latest Patents

Among his latest patents is a method for creating a metal gate structure in semiconductor devices. This method involves forming a gate trench over a semiconductor substrate, depositing various layers, and ultimately forming a contact metal layer. Another notable patent addresses void elimination for gap-filling in high-aspect ratio trenches, which enhances the reliability and performance of semiconductor devices.

Career Highlights

Chih-Hsiang Fan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His work has been instrumental in developing advanced manufacturing techniques that improve device performance and efficiency.

Collaborations

He has collaborated with esteemed colleagues such as Hsien-Ming Lee and Ya-Wen Chiu, contributing to a dynamic research environment that fosters innovation.

Conclusion

Chih-Hsiang Fan's contributions to semiconductor technology exemplify the spirit of innovation. His patents and collaborative efforts continue to shape the future of the industry.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…