Chih-Hsiang Chen

Title: The Innovative Mind of Chih-Hsiang Chen: A Journey Through Semiconductor Patents

Introduction: Chih-Hsiang Chen, an accomplished inventor based in Portland, OR, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of five patents, he has introduced innovative solutions that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents: Chen's latest patents tackle complex issues in the semiconductor manufacturing process. One notable patent focuses on gate structures featuring sidewall spacers formed through selective deposition. This innovation improves the profiles of sidewall spacers, effectively minimizing or eliminating void formation between gate stacks during gap-filling. The process involves creating a gate dielectric layer on a semiconductor substrate, forming a gate stack that comprises a conductive layer and a hard mask, and selectively depositing a liner on the gate stack to achieve a thinner appearance on the hard mask.

Another key patent addresses the method for forming a shallow trench isolation structure with a deep oxide region. This invention involves creating a shallow trench isolation structure on a semiconductor substrate, which includes a masking structure and trench formation through etching. By implanting oxidation enhancing species into the trenches and conducting an oxidation process, this patent enables the formation of a deep oxidation region while ensuring void-free results in the final structure.

Career Highlights: Chih-Hsiang Chen has built a strong reputation as an innovator within Integrated Device Technology, Inc. His role in the company highlights his dedication to advancing semiconductor technologies. His contributions have become foundational in improving production processes and expanding the capabilities of semiconductor devices.

Collaborations: Throughout his career, Chen has collaborated with notable colleagues such as Guo-Qiang Lo and S K Lee. These collaborations have fostered a dynamic exchange of ideas that has led to many advancements in the semiconductor field. Their combined expertise continues to drive innovation within Integrated Device Technology, Inc.

Conclusion: Chih-Hsiang Chen is a prominent figure in semiconductor innovation, with a track record of successful patents that address critical challenges in the industry. His work exemplifies the importance of creativity and collaboration in the pursuit of technological advances. As the semiconductor landscape continues to evolve, inventors like Chen will play an essential role in shaping the future.