Chih-Cheng Lin

Title: Chih-Cheng Lin: Innovator in Semiconductor Technology

Introduction

Chih-Cheng Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advancing semiconductor device structures, which are crucial for modern electronic applications.

Latest Patents

Chih-Cheng Lin's latest patents include innovative semiconductor device structures. One notable patent describes a semiconductor device structure that features a gate dielectric layer. This structure includes a substrate with a base portion and a fin portion, along with an isolation layer surrounding the fin portion. The metal gate stack in this design wraps around the upper part of the fin portion and incorporates a gate dielectric layer that contains fluorine. Another patent outlines a semiconductor device structure that consists of a gate stack over a substrate, which includes multiple layers such as a gate dielectric layer and a silicon-containing layer. These advancements are pivotal in enhancing the performance and efficiency of semiconductor devices.

Career Highlights

Throughout his career, Chih-Cheng Lin has worked with leading companies in the semiconductor industry. He has been associated with Taiwan Semiconductor Manufacturing Company Ltd. and Chinese Petroleum Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Chih-Cheng Lin has collaborated with notable professionals in his field, including I-Ming Chang and Ziwei Fang. These collaborations have contributed to the development of cutting-edge technologies in semiconductor devices.

Conclusion

Chih-Cheng Lin is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. His patents reflect his commitment to innovation and excellence in the field.