Chien-Li Chen

Title: Innovations by Chien-Li Chen

Introduction

Chien-Li Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly in ion implantation systems. With a total of 2 patents, his work has advanced the technology used in wafer temperature measurement and calibration systems.

Latest Patents

One of Chien-Li Chen's latest patents is focused on wafer temperature measurement in an ion implantation system. This patent describes a system that includes a robotic arm, load lock chambers, a pre-implantation station, an ion implanter, and a post-implantation station. The pre-implantation station is designed to heat or cool a wafer before ion implantation, while the post-implantation station does the same afterward. The system is equipped with a controller that manages these processes and determines the current temperature of the wafer based on data from the stations.

Another significant patent by Chen is a calibration system that utilizes a camera for semiconductor processing devices. This method involves taking pictures of an element, moving it incrementally, and comparing the images to achieve accurate calibration. This innovative approach enhances the precision of semiconductor manufacturing processes.

Career Highlights

Chien-Li Chen is currently employed at Advanced Ion Beam Technology, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in ion implantation and calibration systems has positioned him as a key player in advancing semiconductor processing techniques.

Collaborations

Chien-Li Chen collaborates with talented individuals in his field, including Yu-Ho Ni and Chien-Cheng Kuo. Their combined efforts contribute to the innovative projects at Advanced Ion Beam Technology, Inc.

Conclusion

Chien-Li Chen's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of ion implantation systems and calibration methods, making significant strides in technology.