The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Nov. 09, 2018
Applicant:

Advanced Ion Beam Technology, Inc., Hsinchu, TW;

Inventors:

Chien-Li Chen, Tainan, TW;

Yu-Ho Ni, Tainan, TW;

Chien-Cheng Kuo, Tainan, TW;

Te-min Wang, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/73 (2017.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 7/74 (2017.01); H01L 21/681 (2013.01); G06T 2207/30164 (2013.01);
Abstract

A method for calibrating element in a semiconductor processing device with a camera is provided. The method for calibrating element in a semiconductor processing device with a camera includes taking a first picture of a first element by a camera; providing a first actuator to move the first element an increment along a first direction; taking a second picture of the first element by the camera; and comparing the first picture and the second picture to calibrate the first element. A system for calibrating element in a semiconductor processing device with a camera is also provided.


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