Company Filing History:
Years Active: 2007-2010
Title: Chien-Hua Lung: Innovator in Dielectric Layer Fabrication
Introduction
Chien-Hua Lung is an accomplished inventor based in Hsinchu County, Taiwan, known for his significant contributions to the field of semiconductor manufacturing. With two patents to his name, Lung has been instrumental in advancing the techniques used for fabricating dielectric layers, which are crucial components in various electronic devices.
Latest Patents
Chien-Hua Lung's latest patents revolve around innovative methods for creating dielectric layers. His patent titled "Multi-step annealing process" describes a sophisticated procedure for fabricating a dielectric layer over a substrate. The process involves a nitridation step followed by two annealing stages, each utilizing specific ratios of inert gas and oxygen, with temperatures reaching or exceeding 950°C. This method notably enhances the uniformity of nitrogen dopants within the dielectric layer.
Another significant patent by Lung is for a "Method for fabricating dielectric layer doped with nitrogen." This invention involves the formation of a dielectric layer on a semiconductor substrate, undergoing two nitridation processes followed by one or two annealing steps. The resulting dielectric layer boasts a homogeneous distribution of nitrogen dopants, leading to improved electrical properties.
Career Highlights
Currently, Chien-Hua Lung works at United Microelectronics Corporation, where he applies his expertise in semiconductor technologies. His contributions to the industry have made him a noteworthy figure in the field of electronics, particularly in the enhancement of dielectric materials.
Collaborations
Throughout his career, Lung has collaborated with distinguished colleagues, including Yun-Ren Wang and Ying-Wei Yen. These partnerships have fostered a collaborative environment that promotes innovation and the development of groundbreaking technologies in semiconductor fabrication.
Conclusion
Chien-Hua Lung's inventive spirit and technical prowess have positioned him as a valuable contributor to the advancements in semiconductor technology. His patents, particularly in the area of dielectric layer fabrication, demonstrate his commitment to improving electronic components, which play an essential role in modern technology. As the industry continues to evolve, the impact of his work will undoubtedly be felt in the years to come.