Hsinchu, Taiwan

Chien-Hong Chen

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chien-Hong Chen. Retrieved from https://idiyas.com/inventor/chien-hong-chen-k1zmluhd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Chien-Hong Chen in Semiconductor Technology

Introduction

Chien-Hong Chen is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device design and fabrication.

Latest Patents

Chien-Hong Chen's latest patents include a 2D-channel transistor structure with asymmetric substrate contacts. This invention provides a method for forming semiconductor devices that involves depositing a two-dimensional material layer over a semiconductor structure. The process includes forming a source feature and a drain feature that are electrically connected to both the semiconductor structure and the 2D material layer. Additionally, a gate structure is formed over the two-dimensional material layer, which is interposed between the source and drain features. This configuration allows for the creation of a field-effect transistor, where the semiconductor structure and the 2D material layer serve as the first and second channels, respectively.

Another notable patent is a semiconductor device and method for forming the same. This method includes forming a dielectric layer over a substrate and a carbon nanotube (CNT) over the dielectric layer. A dummy gate structure is then formed over the CNT, followed by the creation of gate spacers on opposite sidewalls. Source and drain epitaxy structures are formed on either side of the dummy gate structure, which are then replaced with a metal gate structure. Finally, source and drain contacts are formed over the epitaxy structures.

Career Highlights

Chien-Hong Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing semiconductor device technology, contributing to the development of more efficient and effective electronic components.

Collaborations

Chien-Hong Chen has collaborated with notable colleagues, including Mahaveer Sathaiya Dhanyakumar and Cheng-Ting Chung. These collaborations have further enhanced his research and development efforts in semiconductor technology.

Conclusion

Chien-Hong Chen's innovative work in semiconductor technology, particularly through his recent patents, highlights his significant impact on the industry. His contributions continue to shape the future of electronic devices and materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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