Taipei, Taiwan

Chieh-Hsiung Kuan

This inventor holds 10 USPTO granted patents and 3 published patent applications. Top assignees: Planck Co., Ltd., Kingwave Corporation, National Taiwan University. Active years: 2002-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chieh-Hsiung Kuan. Retrieved from https://idiyas.com/inventor/chieh-hsiung-kuan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 30.0

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2002-2018

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10 patents (USPTO):Explore Patents

Title: Chieh-Hsiung Kuan: Innovator in Electron-Beam Lithography and Optoelectronic Devices

Introduction

Chieh-Hsiung Kuan is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the fields of electron-beam lithography and optoelectronic devices. With a total of 10 patents to his name, Kuan's work has advanced the technology used in various electronic applications.

Latest Patents

One of Kuan's latest patents is an electron-beam lithography method and system. This method involves computing and outputting a development time for a positive-tone electron-sensitive layer, along with a parameter recipe for an electron-beam device. The process includes performing a low-temperature treatment to chill a developer solution and utilizing an electron-beam to irradiate an exposure region of the positive-tone electron-sensitive layer. This innovative approach allows for more accurate control over the dimensions of the development pattern, ultimately enhancing the precision of the lithography process.

Another notable patent is for an optoelectronic device featuring a surface periodic grating structure. This invention includes a substrate and a multi-layer semiconductor structure layer, with a periodic grating structure layer embedded within it. The design optimizes the interaction of incident light with the semiconductor layer, enhancing the optoelectric properties of the device. The manufacturing method involves selecting parameters for the periodic grating structure and etching it into the multi-layer semiconductor structure layer.

Career Highlights

Throughout his career, Kuan has worked with various companies, including Planck Co., Ltd. His experience in the industry has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Kuan has collaborated with notable coworkers such as Chiu-Chang Huang and Vin-Cent Su. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Chieh-Hsiung Kuan's contributions to electron-beam lithography and optoelectronic devices highlight his role as a leading inventor in the field. His innovative patents and collaborative efforts continue to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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