Chian Yuh Sin

Title: Innovations by Chian Yuh Sin in Semiconductor Technology

Introduction

Chian Yuh Sin is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He holds two patents that focus on improving the manufacturing processes of semiconductor devices. His work has significantly impacted the efficiency and reliability of integrated circuits.

Latest Patents

Chian Yuh Sin's latest patents include methods for the elimination of arsenic-based defects in semiconductor devices with isolation regions. This invention outlines techniques for preparing conductive regions, such as source and drain regions, for silicidation procedures. The methods involve the removal of native oxide and arsenic-based defects from conductive surfaces before the deposition of metal components for metal silicide regions. Additionally, his patent describes a hydrofluoric acid cycle that aids in releasing arsenic from shallow trench isolation regions, preventing re-deposition on the source and drain regions.

Another significant patent is related to the manufacturing of integrated circuits with a protective moat. This method involves forming an intermetal dielectric layer over a substrate and semiconductor device, followed by the creation of a metal wire and a passivation layer. A protective moat is then established between the metal wire and the edge of the integrated circuit, enhancing the device's durability and performance.

Career Highlights

Chian Yuh Sin is currently employed at Chartered Semiconductor Manufacturing Ltd, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the manufacturing processes that are critical for modern electronic devices.

Collaborations

Chian has collaborated with notable coworkers, including Fan Zhang and Kho Liep Chok, who have contributed to his research and development efforts in semiconductor technology.

Conclusion

Chian Yuh Sin's innovative patents and contributions to semiconductor technology demonstrate his commitment to enhancing the efficiency and reliability of integrated circuits. His work continues to influence the field and pave the way for future advancements in semiconductor manufacturing.