Chia-Hsin Hou

Title: Innovations of Chia-Hsin Hou

Introduction

Chia-Hsin Hou is a prominent inventor based in Hsinchu Hsien, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on improving the efficiency and reliability of integrated circuits.

Latest Patents

One of his latest patents is a method of adjusting the size of a photomask pattern. This method involves converting the original coordinates and adjusting the length and width of the original pattern. It also includes correcting the size difference caused by the coordinate conversion based on the results of the length and width adjustments. Another notable patent addresses the reduction of charging damage to integrated circuits during semiconductor manufacturing. This patent describes a semiconductor substrate with an integrated circuit die area surrounded by a scribe lane, featuring trench isolation regions that enhance device performance.

Career Highlights

Chia-Hsin Hou is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor technology, making him a valuable asset to his organization.

Collaborations

He has collaborated with notable coworkers, including Tz-Guei Jung and Joe Ko, who share his commitment to innovation in the semiconductor field.

Conclusion

Chia-Hsin Hou's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in integrated circuit technology.