Changhua County, Taiwan

Chia-Hsi Wang

USPTO Granted Patents = 12 

Average Co-Inventor Count = 2.7

ph-index = 1


Location History:

  • Changhua County, TW (2018 - 2023)
  • Hsinchu, TW (2023)

Company Filing History:


Years Active: 2018-2025

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12 patents (USPTO):Explore Patents

Title: Innovations of Chia-Hsi Wang

Introduction

Chia-Hsi Wang is a prominent inventor based in Changhua County, Taiwan. He has made significant contributions to the field of physical vapor deposition (PVD) technology, holding a total of 12 patents. His work focuses on enhancing the efficiency and effectiveness of film deposition processes.

Latest Patents

Among his latest patents is a method for in situ and tunable deposition of a film. This method involves introducing a first physical vapor deposition (PVD) target and a second PVD target into a PVD system. The first target contains a boron-containing cobalt iron alloy (FeCoB) with an initial boron concentration, while the second target contains boron. The method determines parameters of the PVD system based on a target boron concentration larger than the initial boron concentration, allowing for the deposition of a FeCoB film on a substrate according to these parameters.

Another notable patent is related to physical vapor deposition (PVD) with target erosion profile monitoring. This PVD system includes a chamber body, a substrate support, a PVD target, and a target profile monitoring subsystem. The PVD target consists of a target plate made from a target material and a backing plate. The design of the target plate includes a central section and a peripheral section, with the peripheral section having a greater thickness than the central section. The monitoring subsystem is designed to track the usage of the target plate effectively.

Career Highlights

Chia-Hsi Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor manufacturing. His expertise in PVD technology has made him a valuable asset to the company.

Collaborations

He has collaborated with notable coworkers, including Yen-Yu Chen and Kun-Che Ho, contributing to various projects that enhance the capabilities of PVD systems.

Conclusion

Chia-Hsi Wang's contributions to the field of physical vapor deposition are significant, with multiple patents that advance technology in semiconductor manufacturing. His work continues to influence the industry and drive innovation forward.

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