Hsinchu, Taiwan

Chia-Chin Shen

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2014-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia-Chin Shen. Retrieved from https://idiyas.com/inventor/chia-chin-shen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):Explore Patents

Title: Chia-Chin Shen: Innovator in High Voltage Device Technology

Introduction

Chia-Chin Shen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of high voltage devices. With a total of 2 patents to his name, Shen's work is recognized for its innovative approaches and technical advancements.

Latest Patents

Shen's latest patents focus on methods of forming high voltage devices. One of his patents describes a method that includes forming a buried well region of a first dopant type in a substrate. This method also involves creating a well region of the first dopant type over the buried well region, along with a first well region of a second dopant type positioned between the two. Additionally, a second well region of the second dopant type is formed in the well region of the first dopant type, and an isolation structure is established within the well region. A first gate electrode is then formed over the isolation structure and the second well region.

Another patent by Shen details a high voltage device that comprises a well region of a first dopant type in a substrate, with a first well region of a second dopant type located within it. An isolation structure is partially disposed in the well region, and a first gate electrode is placed over the isolation structure and the first well region. The device also features a second well region of the second dopant type, which is spaced from the first well region, along with a second gate electrode positioned between the two well regions.

Career Highlights

Chia-Chin Shen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals in the field, enhancing the innovation and development of advanced semiconductor technologies.

Collaborations

Some of Shen's notable coworkers include Fu Chin Yang and Chih-Chang Cheng. Their collaborative efforts contribute to the ongoing advancements in semiconductor technology and high voltage device development.

Conclusion

Chia-Chin Shen is a key figure in the semiconductor industry, known for his innovative patents and contributions to high voltage device technology. His work continues to influence the field and drive advancements in semiconductor applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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