Chia-Chi Yu

Title: Chia-Chi Yu: Innovator in Semiconductor Technology

Introduction

Chia-Chi Yu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His innovative work focuses on advanced methods for semiconductor device formation.

Latest Patents

Chia-Chi Yu's latest patents include a semiconductor device and methods of formation. One notable patent describes a two-step etch technique used in a continuous polysilicon on oxide definition edge (CPODE) recess process. This process involves performing a first etch operation using an isotropic etch technique to create a recess in a dummy gate structure to a first depth. A second etch operation employs an anisotropic etch technique to deepen the recess, resulting in a highly directional etch that minimizes unwanted etching into adjacent interlayer dielectric layers and source/drain regions. Another patent outlines a method for manufacturing a semiconductor device, detailing the formation of multiple dielectric layers over semiconductor fins, leading to the creation of a wall fin that separates source/drain epitaxial layers.

Career Highlights

Chia-Chi Yu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor manufacturing techniques, contributing to the efficiency and effectiveness of device production.

Collaborations

Chia-Chi Yu has collaborated with notable colleagues, including Chih-Teng Liao and Yu-Li Lin. These partnerships have fostered innovation and development in semiconductor technologies.

Conclusion

Chia-Chi Yu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.