Company Filing History:
Years Active: 2014-2015
Title: Chi-Sheng Juan: Innovator in Semiconductor Technology
Introduction
Chi-Sheng Juan is a prominent inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative methods have advanced the processes involved in semiconductor manufacturing.
Latest Patents
Chi-Sheng Juan's latest patents include a method to form multiple trenches utilizing a grayscale mask. This patent describes a technique for creating a plurality of openings within a substrate using a single photo exposure and etch process. The method involves aligning a photoresist layer with a photomask that contains transparent, grayscale, and opaque areas. By exposing the photomask and substrate to radiation in a single illumination step, a 3-dimensional pattern is formed, allowing for openings of varying depths within the substrate.
Another notable patent is for shallow via formation by oxidation. This invention provides a method and apparatus for constructing shallow recessed wells on exposed conductive vias on the surface of a semiconductor. The shallow wells are filled with a conductive cap layer, such as tantalum nitride (TaN), to prevent oxidation that may occur when exposed to air or during metallization processes.
Career Highlights
Chi-Sheng Juan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor processes. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing techniques.
Collaborations
Chi-Sheng Juan has collaborated with notable colleagues, including Lin-Ya Huang and Chien-Lin Tseng. These partnerships have contributed to the development of advanced technologies in the semiconductor industry.
Conclusion
Chi-Sheng Juan's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the future of semiconductor manufacturing processes.