Chi-Ming Lu

Title: **Chi-Ming Lu: A Pioneer in Semiconductor Innovation**

Introduction

Chi-Ming Lu is a distinguished inventor based in Kaohsiung, Taiwan, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 14 patents, Lu has been at the forefront of developing advanced methods that enhance the efficiency and reliability of semiconductor devices.

Latest Patents

Among Lu's latest innovations are two notable patents that have the potential to revolutionize semiconductor fabrication processes. The first patent, titled **Method of Forming Semiconductor Device**, outlines a technique for fabricating a semiconductor device by strategically forming films with differing stress types and intensities. This method allows the second film to compensate for any stress induced by substrate non-flatness, thereby improving the overall performance of the device.

The second patent, **Method for Forming Titanium Nitride Barrier with Small Surface Grains in Interconnects**, describes a process that begins with the formation of a first conductive layer on a substrate. It goes on to detail the creation of a dielectric layer, a through hole exposing the conductive layer, and a glue layer designed to ensure optimal conductivity and durability of the contact vias. This innovative approach to interconnects represents a significant advancement in semiconductor technology, focusing on the enhancement of reliability through meticulous layer construction.

Career Highlights

Chi-Ming Lu has worked with several prominent companies throughout his career, including Taiwan Semiconductor Manufacturing Company Ltd., where he gained invaluable experience in semiconductor manufacturing processes. His tenure at Jr De Exact Industrial Co., Ltd. further solidified his expertise, allowing him to implement his innovative techniques in real-world applications. Lu's extensive background has played a crucial role in shaping modern semiconductor technology.

Collaborations

Throughout his career, Lu has collaborated with numerous talented individuals, including his notable coworkers Jung-Chih Tsao and Yao-Hsiang Liang. These collaborations have helped foster an environment of creativity and innovation, leading to the successful development of cutting-edge semiconductor technologies that continue to impact the industry.

Conclusion

Chi-Ming Lu stands as a beacon of innovation in the semiconductor field. His dedication to enhancing the manufacturing processes and the quality of semiconductor devices through his patents is a testament to his ingenuity and commitment to advancing technology. As the semiconductor industry continues to evolve, Lu's contributions will undoubtedly leave a lasting legacy.