San Jose, CA, United States of America

Chi-Hsiang Fan

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2020-2023

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6 patents (USPTO):

Title: The Innovative Mind of Chi-Hsiang Fan: Revolutionizing Semiconductor Manufacturing

Introduction:

Chi-Hsiang Fan, a brilliant inventor based in San Jose, CA, has made significant contributions to the field of semiconductor manufacturing. With a total of 6 patents to his name, his innovative approach has garnered recognition in the industry.

Latest Patents:

Among his latest patents is a groundbreaking "Method for determining an etch profile of a layer of a wafer for a simulation system." This method involves intricate processes such as determining masking layer profiles, flux information, and re-deposition information to accurately predict the etch profile of a wafer layer. Another notable patent is the "Method of determining a position of a feature," which focuses on precise positioning of features on substrates using relative position knowledge.

Career Highlights:

Chi-Hsiang Fan is affiliated with Asml Netherlands B.V., a prominent company in the semiconductor equipment industry. His expertise and dedication have been instrumental in developing cutting-edge technologies that have transformed semiconductor manufacturing processes.

Collaborations:

In his professional journey, Chi-Hsiang Fan has collaborated with talented individuals such as Youping Zhang and Maurits Van Der Schaar. These partnerships have led to the successful implementation of innovative solutions in the semiconductor domain.

Conclusion:

In conclusion, Chi-Hsiang Fan's inventive spirit and technical prowess have established him as a key figure in the realm of semiconductor manufacturing. His patents and collaborations reflect a commitment to pushing boundaries and advancing the field. Keep an eye on this visionary inventor for future breakthroughs in the industry.

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