The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Jan. 16, 2020
Asml Netherlands B.v., Veldhoven, NL;
Ralph Timotheus Huijgen, Hillsboro, CA (US);
Marc Jurian Kea, Moran Hill, CA (US);
Marcel Theodorus Maria Van Kessel, Maastricht, NL;
Masashi Ishibashi, Eindhoven, NL;
Chi-Hsiang Fan, San Jose, CA (US);
Hakki Ergün Cekli, Eindhoven, NL;
Youping Zhang, Cupertino, CA (US);
Maurits Van Der Schaar, Eindhoven, NL;
Liping Ren, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.