The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
May. 21, 2019
Asml Netherlands B.v., Veldhoven, NL;
Danying Li, Shenzhen, CN;
Chi-Hsiang Fan, San Jose, CA (US);
Abdalmohsen Elmalk, Eindhoven, NL;
Youping Zhang, Cupertino, CA (US);
Jay Jianhui Chen, Fremont, CA (US);
Kui-Jun Huang, Shenzhen, CN;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for determining a stack configuration for a substrate subjected to a patterning process. The method includes obtaining (i) measurement data of a stack configuration with location information on a printed substrate, (ii) a substrate model configured to predict a stack characteristic based on a location of the substrate, and (iii) a stack map including a plurality of stack configurations based on the substrate model. The method iteratively determines values of model parameters of the substrate model based on a fitting between the measurement data and the plurality of stack configurations of the stack map, and predicts an optimum stack configuration at a particular location based on the substrate model using the values of the model parameters.