Hsinchu, Taiwan

Chi-Hsiang Chang

USPTO Granted Patents = 7 

Average Co-Inventor Count = 5.7

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Hsinchu, TW (2022 - 2024)
  • Taoyuan, TW (2023 - 2024)

Company Filing History:


Years Active: 2022-2025

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Title: Innovations of Chi-Hsiang Chang

Introduction

Chi-Hsiang Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "Multi-layer dielectric refill for profile control in semiconductor devices." This invention involves the formation of a trench above a fin of a semiconductor device and the creation of a multi-layer dielectric structure within the trench. The profile of this structure can be controlled based on the application, which helps to reduce shadowing effects and minimize the risk of cut failures. The multi-layer dielectric structure can consist of two layers, three layers, or more, and can feature various profiles such as stepped or linear.

Another notable patent is "Semiconductor devices and methods of manufacturing thereof." This patent describes a method for fabricating a semiconductor device, which includes providing a substrate and forming a plurality of fins extending from it. The fins consist of a first group of active fins in an active region and an inactive fin in an inactive region. The design includes dummy fins and gates to enhance the device's functionality.

Career Highlights

Chi-Hsiang Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to advancements in semiconductor manufacturing processes and device performance.

Collaborations

He has collaborated with notable coworkers, including Ya-Yi Tsai and Shih-Yao Lin, who have also contributed to the field of semiconductor technology.

Conclusion

Chi-Hsiang Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices.

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