Chi-Che Tseng

Title: Chi-Che Tseng: Innovator in IC Manufacturing

Introduction

Chi-Che Tseng is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of integrated circuit (IC) manufacturing. With a total of 2 patents, Tseng's work focuses on innovative methods that enhance the efficiency and effectiveness of IC fabrication processes.

Latest Patents

One of Tseng's latest patents is a method and structure for mandrel and spacer patterning. This IC manufacturing method involves forming first and second mandrels over a substrate. It also includes creating first spacers on the sidewalls of the first mandrels and second spacers on the sidewalls of the second mandrels. Each of these spacers features a loop structure with two curvy portions connected by two lines. The method further entails removing the first and second mandrels, as well as selectively removing the curvy portions from the first spacers without affecting those on the second spacers. The second spacers play a crucial role in monitoring variations in the IC fabrication processes.

Career Highlights

Chi-Che Tseng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in IC technology.

Collaborations

Throughout his career, Tseng has collaborated with notable colleagues, including Chen-Yuan Wang and Wilson Hsieh. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies in the semiconductor field.

Conclusion

Chi-Che Tseng is a key figure in the realm of IC manufacturing, with a focus on innovative methods that improve fabrication processes. His contributions, including his latest patents, highlight his commitment to advancing technology in the semiconductor industry.