Hsin-Chu, Taiwan

Cheng-Hung Wang

USPTO Granted Patents = 7 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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7 patents (USPTO):Explore Patents

Title: The Innovations of Cheng-Hung Wang: A Pioneer in Semiconductor Technologies

Introduction

Cheng-Hung Wang is a distinguished inventor based in Hsin-Chu, Taiwan, with a remarkable portfolio consisting of seven patents. His contributions to semiconductor technology have greatly impacted the industry, particularly in innovative structures and methods that enhance device performance and reliability.

Latest Patents

Cheng-Hung Wang's recent patents showcase his expertise in silicon-on-insulator (SOI) technology. One notable patent is titled "Structures and Methods for Trench Isolation," which details a SOI structure comprising a substrate, a dielectric layer, and a polysilicon region. This innovative design features a trench extending from the upper surface of a buried layer down to a handle layer, enhancing isolation and performance in semiconductor devices.

Another significant patent is focused on "Structures and Methods for Reducing Process Charging Damages." This invention outlines a novel SOI structure that includes a polysilicon region and an etch stop layer, which plays a critical role in minimizing damage during manufacturing processes. Both patents emphasize Cheng-Hung Wang's commitment to advancing SOI technologies.

Career Highlights

Cheng-Hung Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), a global leader in the semiconductor industry. His tenure at TSMC has allowed him to collaborate with cutting-edge technologies and contribute significantly to the company's innovation landscape. His work is characterized by a deep understanding of semiconductor processes and a drive to improve the overall efficiency of manufacturing techniques.

Collaborations

Throughout his career, Cheng-Hung has collaborated with esteemed colleagues, including Kuan-Jung Chen and Tsung-Lin Lee. These joint efforts further reflect the synergy and innovative spirit present within TSMC, contributing to advancements in semiconductor fabrication and design.

Conclusion

In conclusion, Cheng-Hung Wang stands out as a pivotal figure in the semiconductor field, with seven patents that not only showcase his inventiveness but also his dedication to advancing technology. His innovative contributions, particularly in trench isolation and process charging damage reduction, will undoubtedly influence the future of semiconductor manufacturing and inspire the next generation of inventors.

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